A study of the cause of residual stresses in sputtered films

Bibliographic Details
Main Author: Hudson, Craig
Published: University of Cambridge 1995
Subjects:
Online Access:http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.387735
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spelling ndltd-bl.uk-oai-ethos.bl.uk-3877352015-03-19T09:47:34ZA study of the cause of residual stresses in sputtered filmsHudson, Craig1995530.41Solid-state physicsUniversity of Cambridgehttp://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.387735Electronic Thesis or Dissertation
collection NDLTD
sources NDLTD
topic 530.41
Solid-state physics
spellingShingle 530.41
Solid-state physics
Hudson, Craig
A study of the cause of residual stresses in sputtered films
author Hudson, Craig
author_facet Hudson, Craig
author_sort Hudson, Craig
title A study of the cause of residual stresses in sputtered films
title_short A study of the cause of residual stresses in sputtered films
title_full A study of the cause of residual stresses in sputtered films
title_fullStr A study of the cause of residual stresses in sputtered films
title_full_unstemmed A study of the cause of residual stresses in sputtered films
title_sort study of the cause of residual stresses in sputtered films
publisher University of Cambridge
publishDate 1995
url http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.387735
work_keys_str_mv AT hudsoncraig astudyofthecauseofresidualstressesinsputteredfilms
AT hudsoncraig studyofthecauseofresidualstressesinsputteredfilms
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