A study of the cause of residual stresses in sputtered films
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1995
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ndltd-bl.uk-oai-ethos.bl.uk-3877352015-03-19T09:47:34ZA study of the cause of residual stresses in sputtered filmsHudson, Craig1995530.41Solid-state physicsUniversity of Cambridgehttp://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.387735Electronic Thesis or Dissertation |
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NDLTD |
sources |
NDLTD |
topic |
530.41 Solid-state physics |
spellingShingle |
530.41 Solid-state physics Hudson, Craig A study of the cause of residual stresses in sputtered films |
author |
Hudson, Craig |
author_facet |
Hudson, Craig |
author_sort |
Hudson, Craig |
title |
A study of the cause of residual stresses in sputtered films |
title_short |
A study of the cause of residual stresses in sputtered films |
title_full |
A study of the cause of residual stresses in sputtered films |
title_fullStr |
A study of the cause of residual stresses in sputtered films |
title_full_unstemmed |
A study of the cause of residual stresses in sputtered films |
title_sort |
study of the cause of residual stresses in sputtered films |
publisher |
University of Cambridge |
publishDate |
1995 |
url |
http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.387735 |
work_keys_str_mv |
AT hudsoncraig astudyofthecauseofresidualstressesinsputteredfilms AT hudsoncraig studyofthecauseofresidualstressesinsputteredfilms |
_version_ |
1716771395728310272 |