Some electronic properties of thin dielectric oxide films containing cerium, niobium, vanadium and silicon

Bibliographic Details
Main Author:	Mian, A. R.
Published:	Brunel University 1988
Subjects:	530.41 Optical properties/thin films
Online Access:	http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.384096

id	ndltd-bl.uk-oai-ethos.bl.uk-384096
record_format	oai_dc
spelling	ndltd-bl.uk-oai-ethos.bl.uk-3840962015-03-19T10:27:17ZSome electronic properties of thin dielectric oxide films containing cerium, niobium, vanadium and siliconMian, A. R.1988530.41Optical properties/thin filmsBrunel Universityhttp://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.384096Electronic Thesis or Dissertation
collection	NDLTD
sources	NDLTD
topic	530.41 Optical properties/thin films
spellingShingle	530.41 Optical properties/thin films Mian, A. R. Some electronic properties of thin dielectric oxide films containing cerium, niobium, vanadium and silicon
author	Mian, A. R.
author_facet	Mian, A. R.
author_sort	Mian, A. R.
title	Some electronic properties of thin dielectric oxide films containing cerium, niobium, vanadium and silicon
title_short	Some electronic properties of thin dielectric oxide films containing cerium, niobium, vanadium and silicon
title_full	Some electronic properties of thin dielectric oxide films containing cerium, niobium, vanadium and silicon
title_fullStr	Some electronic properties of thin dielectric oxide films containing cerium, niobium, vanadium and silicon
title_full_unstemmed	Some electronic properties of thin dielectric oxide films containing cerium, niobium, vanadium and silicon
title_sort	some electronic properties of thin dielectric oxide films containing cerium, niobium, vanadium and silicon
publisher	Brunel University
publishDate	1988
url	http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.384096
work_keys_str_mv	AT mianar someelectronicpropertiesofthindielectricoxidefilmscontainingceriumniobiumvanadiumandsilicon
_version_	1716774879055839232

Some electronic properties of thin dielectric oxide films containing cerium, niobium, vanadium and silicon

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