Characterisation and performance of optical lithography systems
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University of Edinburgh
1987
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Online Access: | http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.380429 |
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ndltd-bl.uk-oai-ethos.bl.uk-3804292016-06-21T03:22:27ZCharacterisation and performance of optical lithography systemsMaxwell, Graeme Dunlop1987770Lithographic use in ICUniversity of Edinburghhttp://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.380429http://hdl.handle.net/1842/15296Electronic Thesis or Dissertation |
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NDLTD |
sources |
NDLTD |
topic |
770 Lithographic use in IC |
spellingShingle |
770 Lithographic use in IC Maxwell, Graeme Dunlop Characterisation and performance of optical lithography systems |
author |
Maxwell, Graeme Dunlop |
author_facet |
Maxwell, Graeme Dunlop |
author_sort |
Maxwell, Graeme Dunlop |
title |
Characterisation and performance of optical lithography systems |
title_short |
Characterisation and performance of optical lithography systems |
title_full |
Characterisation and performance of optical lithography systems |
title_fullStr |
Characterisation and performance of optical lithography systems |
title_full_unstemmed |
Characterisation and performance of optical lithography systems |
title_sort |
characterisation and performance of optical lithography systems |
publisher |
University of Edinburgh |
publishDate |
1987 |
url |
http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.380429 |
work_keys_str_mv |
AT maxwellgraemedunlop characterisationandperformanceofopticallithographysystems |
_version_ |
1718312533322891264 |