Maximum-entropy mobility spectrum of two-dimensional hole gas in strained-Si₁-ₓGeₓ/Si heterostructures

Magnetotransport properties of modulation-doped p-type Si₁-ₓGeₓ/Si and Si₁-ₓGeₓ/Si₁₋<sub>y</sub>Ge<sub>y</sub> heterostructures were studied, in the magnetic field range 0-12 T, and in the temperature range 0.35-300 K. The experimental data within the classical regime have be...

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Main Author: Kiatgamolchai, Somchai
Published: University of Warwick 2000
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Online Access:http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.364676
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spelling ndltd-bl.uk-oai-ethos.bl.uk-3646762015-03-19T03:51:54ZMaximum-entropy mobility spectrum of two-dimensional hole gas in strained-Si₁-ₓGeₓ/Si heterostructuresKiatgamolchai, Somchai2000Magnetotransport properties of modulation-doped p-type Si₁-ₓGeₓ/Si and Si₁-ₓGeₓ/Si₁₋<sub>y</sub>Ge<sub>y</sub> heterostructures were studied, in the magnetic field range 0-12 T, and in the temperature range 0.35-300 K. The experimental data within the classical regime have been analysed by mobility spectrum analysis, in order to separate the influences of different parallel conduction paths. A new method of mobility spectrum analysis has been developed by the author, based on the concept of maximum-entropy, and this computation has been shown to overcome several drawbacks or limitations of previous mobility spectrum methods of calculation. The data have also been analysed by Beck & Anderson's analysis and the multicarrier fitting method for comparison. Analysis of the magnetic-field-dependent resistivity tensors reveals a two-dimensional hole gas (2DHG) in the Si/SiGe/Si quantum well, carriers in the boron-doped cap layer, and an unknown electron-like carrier. The carrier density of the 2DHG can either remain constant (x = 0.1), increase (x = 0.13), or decrease (x ≥ 0.2), with increasing temperatures. Differences in the temperature dependences are partly attributed to different growth conditions. A decreasing carrier density with increase in temperatures may indicate the presence of acceptor-like defect states near the valence band edge of the SiGe channel. The mobility of the 2DHG between 100-300 K has the form AT⁻<sup>γ</sup> and γ has the bowl shape with the minimum at x ~ 0.25-0.3. These characteristics suggest a possible influence of alloy disorder scattering. The mobilities and activation energies of the carriers in the boron-doped cap vary between samples and this is believed to be due to boron-spike near the Si/Si-substrate interface, in some samples. The source of electron-like carrier is presently unknown.530.41QC PhysicsUniversity of Warwickhttp://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.364676http://wrap.warwick.ac.uk/56132/Electronic Thesis or Dissertation
collection NDLTD
sources NDLTD
topic 530.41
QC Physics
spellingShingle 530.41
QC Physics
Kiatgamolchai, Somchai
Maximum-entropy mobility spectrum of two-dimensional hole gas in strained-Si₁-ₓGeₓ/Si heterostructures
description Magnetotransport properties of modulation-doped p-type Si₁-ₓGeₓ/Si and Si₁-ₓGeₓ/Si₁₋<sub>y</sub>Ge<sub>y</sub> heterostructures were studied, in the magnetic field range 0-12 T, and in the temperature range 0.35-300 K. The experimental data within the classical regime have been analysed by mobility spectrum analysis, in order to separate the influences of different parallel conduction paths. A new method of mobility spectrum analysis has been developed by the author, based on the concept of maximum-entropy, and this computation has been shown to overcome several drawbacks or limitations of previous mobility spectrum methods of calculation. The data have also been analysed by Beck & Anderson's analysis and the multicarrier fitting method for comparison. Analysis of the magnetic-field-dependent resistivity tensors reveals a two-dimensional hole gas (2DHG) in the Si/SiGe/Si quantum well, carriers in the boron-doped cap layer, and an unknown electron-like carrier. The carrier density of the 2DHG can either remain constant (x = 0.1), increase (x = 0.13), or decrease (x ≥ 0.2), with increasing temperatures. Differences in the temperature dependences are partly attributed to different growth conditions. A decreasing carrier density with increase in temperatures may indicate the presence of acceptor-like defect states near the valence band edge of the SiGe channel. The mobility of the 2DHG between 100-300 K has the form AT⁻<sup>γ</sup> and γ has the bowl shape with the minimum at x ~ 0.25-0.3. These characteristics suggest a possible influence of alloy disorder scattering. The mobilities and activation energies of the carriers in the boron-doped cap vary between samples and this is believed to be due to boron-spike near the Si/Si-substrate interface, in some samples. The source of electron-like carrier is presently unknown.
author Kiatgamolchai, Somchai
author_facet Kiatgamolchai, Somchai
author_sort Kiatgamolchai, Somchai
title Maximum-entropy mobility spectrum of two-dimensional hole gas in strained-Si₁-ₓGeₓ/Si heterostructures
title_short Maximum-entropy mobility spectrum of two-dimensional hole gas in strained-Si₁-ₓGeₓ/Si heterostructures
title_full Maximum-entropy mobility spectrum of two-dimensional hole gas in strained-Si₁-ₓGeₓ/Si heterostructures
title_fullStr Maximum-entropy mobility spectrum of two-dimensional hole gas in strained-Si₁-ₓGeₓ/Si heterostructures
title_full_unstemmed Maximum-entropy mobility spectrum of two-dimensional hole gas in strained-Si₁-ₓGeₓ/Si heterostructures
title_sort maximum-entropy mobility spectrum of two-dimensional hole gas in strained-si₁-ₓgeₓ/si heterostructures
publisher University of Warwick
publishDate 2000
url http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.364676
work_keys_str_mv AT kiatgamolchaisomchai maximumentropymobilityspectrumoftwodimensionalholegasinstrainedsi1xgexsiheterostructures
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