The diffusion and electrical activation of rapid thermally annealed arsenic implanted silicon
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University of Southampton
1992
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ndltd-bl.uk-oai-ethos.bl.uk-3589942015-03-19T08:46:52ZThe diffusion and electrical activation of rapid thermally annealed arsenic implanted siliconAltrip, John L.1992530.41Solid-state physicsUniversity of Southamptonhttp://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.358994Electronic Thesis or Dissertation |
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530.41 Solid-state physics |
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530.41 Solid-state physics Altrip, John L. The diffusion and electrical activation of rapid thermally annealed arsenic implanted silicon |
author |
Altrip, John L. |
author_facet |
Altrip, John L. |
author_sort |
Altrip, John L. |
title |
The diffusion and electrical activation of rapid thermally annealed arsenic implanted silicon |
title_short |
The diffusion and electrical activation of rapid thermally annealed arsenic implanted silicon |
title_full |
The diffusion and electrical activation of rapid thermally annealed arsenic implanted silicon |
title_fullStr |
The diffusion and electrical activation of rapid thermally annealed arsenic implanted silicon |
title_full_unstemmed |
The diffusion and electrical activation of rapid thermally annealed arsenic implanted silicon |
title_sort |
diffusion and electrical activation of rapid thermally annealed arsenic implanted silicon |
publisher |
University of Southampton |
publishDate |
1992 |
url |
http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.358994 |
work_keys_str_mv |
AT altripjohnl thediffusionandelectricalactivationofrapidthermallyannealedarsenicimplantedsilicon AT altripjohnl diffusionandelectricalactivationofrapidthermallyannealedarsenicimplantedsilicon |
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1716766909906550784 |