The diffusion and electrical activation of rapid thermally annealed arsenic implanted silicon

Bibliographic Details
Main Author: Altrip, John L.
Published: University of Southampton 1992
Subjects:
Online Access:http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.358994
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spelling ndltd-bl.uk-oai-ethos.bl.uk-3589942015-03-19T08:46:52ZThe diffusion and electrical activation of rapid thermally annealed arsenic implanted siliconAltrip, John L.1992530.41Solid-state physicsUniversity of Southamptonhttp://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.358994Electronic Thesis or Dissertation
collection NDLTD
sources NDLTD
topic 530.41
Solid-state physics
spellingShingle 530.41
Solid-state physics
Altrip, John L.
The diffusion and electrical activation of rapid thermally annealed arsenic implanted silicon
author Altrip, John L.
author_facet Altrip, John L.
author_sort Altrip, John L.
title The diffusion and electrical activation of rapid thermally annealed arsenic implanted silicon
title_short The diffusion and electrical activation of rapid thermally annealed arsenic implanted silicon
title_full The diffusion and electrical activation of rapid thermally annealed arsenic implanted silicon
title_fullStr The diffusion and electrical activation of rapid thermally annealed arsenic implanted silicon
title_full_unstemmed The diffusion and electrical activation of rapid thermally annealed arsenic implanted silicon
title_sort diffusion and electrical activation of rapid thermally annealed arsenic implanted silicon
publisher University of Southampton
publishDate 1992
url http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.358994
work_keys_str_mv AT altripjohnl thediffusionandelectricalactivationofrapidthermallyannealedarsenicimplantedsilicon
AT altripjohnl diffusionandelectricalactivationofrapidthermallyannealedarsenicimplantedsilicon
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