Millisecond duration thermal processing of silicon layers

Bibliographic Details
Main Author:	Smith, David Andrew
Published:	University of Cambridge 1988
Subjects:	530.41 Semiconductors
Online Access:	http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.335788

id	ndltd-bl.uk-oai-ethos.bl.uk-335788
record_format	oai_dc
spelling	ndltd-bl.uk-oai-ethos.bl.uk-3357882016-08-04T04:07:56ZMillisecond duration thermal processing of silicon layersSmith, David Andrew1988530.41SemiconductorsUniversity of Cambridgehttp://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.335788Electronic Thesis or Dissertation
collection	NDLTD
sources	NDLTD
topic	530.41 Semiconductors
spellingShingle	530.41 Semiconductors Smith, David Andrew Millisecond duration thermal processing of silicon layers
author	Smith, David Andrew
author_facet	Smith, David Andrew
author_sort	Smith, David Andrew
title	Millisecond duration thermal processing of silicon layers
title_short	Millisecond duration thermal processing of silicon layers
title_full	Millisecond duration thermal processing of silicon layers
title_fullStr	Millisecond duration thermal processing of silicon layers
title_full_unstemmed	Millisecond duration thermal processing of silicon layers
title_sort	millisecond duration thermal processing of silicon layers
publisher	University of Cambridge
publishDate	1988
url	http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.335788
work_keys_str_mv	AT smithdavidandrew milliseconddurationthermalprocessingofsiliconlayers
_version_	1718372618075111424

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