Stress in ion-beam assisted silicon dioxide and tantalum pentoxide thin films

Similar Items

• The electrical properties of gold and tantalum thin films after argon ion implantation
  by: Robinson, R. G. R.
  Published: (1980)
• Ion implantation of tantalum thin films
  by: Goh, K. H.
  Published: (1976)
• Ion beam mixing of thin films on aluminium
  by: Peacock, A. T.
  Published: (1986)
• A study of the formation of silicon oxide thin films using dual ion beam reactive sputtering
  by: Pringle, Steven Derek
  Published: (1994)
• The Research of Tantalum Pentoxide and Zirconium Dioxide as Ion Conducting Layer for Electrochromism
  by: LIN, JYUN-HUEI, et al.
  Published: (2018)