Diagnostics and modelling of an inductively coupled RF low-pressure low-temperature plasma
This thesis is a theoretical model and experimental study of the physics of a low pressure (5-50 mtorr), low electron temperature (1-10 eV), high density (J017 _J01Bm-J ) inductively coupled plasma. This type of plasma is similar to those much used in plasma etching, deposition, and other plasma aid...
Main Author: | Yang, Suidong |
---|---|
Published: |
Open University
1998
|
Subjects: | |
Online Access: | http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.262762 |
Similar Items
-
Investigations of low pressure RF discharges in argon
by: Ingram, S. G.
Published: (1988) -
Development of a low pressure-inductively coupled plasma-ion source for mass spectrometry
by: O'Connor, Gavin Thomas
Published: (1998) -
A diagnostic investigation of RF plasma
by: Chang-jin, Wu
Published: (1991) -
Temporal Langmuir probe measurements in low frequency RF plasmas
by: Anderson, Colin Andrew
Published: (1991) -
Physical characteristics of an inductively coupled radio frequency plasma torch
by: Lightfoot, Nigel Stuart
Published: (1980)