The low temperature oxidation of single crystal silicon in a gaseous plasma

Bibliographic Details
Main Author:	Barlow, K. J.
Published:	University of Liverpool 1987
Subjects:	530.41 Silicon dioxide insulate
Online Access:	http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.234801

id	ndltd-bl.uk-oai-ethos.bl.uk-234801
record_format	oai_dc
spelling	ndltd-bl.uk-oai-ethos.bl.uk-2348012015-03-19T07:37:23ZThe low temperature oxidation of single crystal silicon in a gaseous plasmaBarlow, K. J.1987530.41Silicon dioxide insulateUniversity of Liverpoolhttp://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.234801Electronic Thesis or Dissertation
collection	NDLTD
sources	NDLTD
topic	530.41 Silicon dioxide insulate
spellingShingle	530.41 Silicon dioxide insulate Barlow, K. J. The low temperature oxidation of single crystal silicon in a gaseous plasma
author	Barlow, K. J.
author_facet	Barlow, K. J.
author_sort	Barlow, K. J.
title	The low temperature oxidation of single crystal silicon in a gaseous plasma
title_short	The low temperature oxidation of single crystal silicon in a gaseous plasma
title_full	The low temperature oxidation of single crystal silicon in a gaseous plasma
title_fullStr	The low temperature oxidation of single crystal silicon in a gaseous plasma
title_full_unstemmed	The low temperature oxidation of single crystal silicon in a gaseous plasma
title_sort	low temperature oxidation of single crystal silicon in a gaseous plasma
publisher	University of Liverpool
publishDate	1987
url	http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.234801
work_keys_str_mv	AT barlowkj thelowtemperatureoxidationofsinglecrystalsiliconinagaseousplasma AT barlowkj lowtemperatureoxidationofsinglecrystalsiliconinagaseousplasma
_version_	1716757109295546368

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