Predictive Modeling for Extremely Scaled CMOS and Post Silicon Devices
abstract: To extend the lifetime of complementary metal-oxide-semiconductors (CMOS), emerging process techniques are being proposed to conquer the manufacturing difficulties. New structures and materials are proposed with superior electrical properties to traditional CMOS, such as strain technology...
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| Format: | Doctoral Thesis |
| Language: | English |
| Published: |
2011
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| Online Access: | http://hdl.handle.net/2286/R.I.8849 |