Lateral Programmable Metallization Cells: Materials, Devices and Mechanisms

abstract: Lateral programmable metallization cells (PMC) utilize the properties of electrodeposits grown over a solid electrolyte channel. Such devices have an active anode and an inert cathode separated by a long electrodeposit channel in a coplanar arrangement. The ability to transport large amoun...

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Other Authors: Chamele, Ninad (Author)
Format: Doctoral Thesis
Language:English
Published: 2020
Subjects:
Online Access:http://hdl.handle.net/2286/R.I.63069
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spelling ndltd-asu.edu-item-630692021-01-15T05:01:21Z Lateral Programmable Metallization Cells: Materials, Devices and Mechanisms abstract: Lateral programmable metallization cells (PMC) utilize the properties of electrodeposits grown over a solid electrolyte channel. Such devices have an active anode and an inert cathode separated by a long electrodeposit channel in a coplanar arrangement. The ability to transport large amount of metallic mass across the channel makes these devices attractive for various More-Than-Moore applications. Existing literature lacks a comprehensive study of electrodeposit growth kinetics in lateral PMCs. Moreover, the morphology of electrodeposit growth in larger, planar devices is also not understood. Despite the variety of applications, lateral PMCs are not embraced by the semiconductor industry due to incompatible materials and high operating voltages needed for such devices. In this work, a numerical model based on the basic processes in PMCs – cation drift and redox reactions – is proposed, and the effect of various materials parameters on the electrodeposit growth kinetics is reported. The morphology of the electrodeposit growth and kinetics of the electrodeposition process are also studied in devices based on Ag-Ge30Se70 materials system. It was observed that the electrodeposition process mainly consists of two regimes of growth – cation drift limited regime and mixed regime. The electrodeposition starts in cation drift limited regime at low electric fields and transitions into mixed regime as the field increases. The onset of mixed regime can be controlled by applied voltage which also affects the morphology of electrodeposit growth. The numerical model was then used to successfully predict the device kinetics and onset of mixed regime. The problem of materials incompatibility with semiconductor manufacturing was solved by proposing a novel device structure. A bilayer structure using semiconductor foundry friendly materials was suggested as a candidate for solid electrolyte. The bilayer structure consists of a low resistivity oxide shunt layer on top of a high resistivity ion carrying oxide layer. Devices using Cu2O as the low resistivity shunt on top of Cu doped WO3 oxide were fabricated. The bilayer devices provided orders of magnitude improvement in device performance in the context of operating voltage and switching time. Electrical and materials characterization revealed the structure of bilayers and the mechanism of electrodeposition in these devices. Dissertation/Thesis Chamele, Ninad (Author) Kozicki, Michael (Advisor) Barnaby, Hugh (Committee member) Newman, Nathan (Committee member) Gonzalez-Velo, Yago (Committee member) Arizona State University (Publisher) Electrical engineering Materials Science Condensed matter physics Chalcogenide Electrodeposition Nonvolatile Oxide Programmable Metallization Cell Switching eng 167 pages Doctoral Dissertation Electrical Engineering 2020 Doctoral Dissertation http://hdl.handle.net/2286/R.I.63069 http://rightsstatements.org/vocab/InC/1.0/ 2020
collection NDLTD
language English
format Doctoral Thesis
sources NDLTD
topic Electrical engineering
Materials Science
Condensed matter physics
Chalcogenide
Electrodeposition
Nonvolatile
Oxide
Programmable Metallization Cell
Switching
spellingShingle Electrical engineering
Materials Science
Condensed matter physics
Chalcogenide
Electrodeposition
Nonvolatile
Oxide
Programmable Metallization Cell
Switching
Lateral Programmable Metallization Cells: Materials, Devices and Mechanisms
description abstract: Lateral programmable metallization cells (PMC) utilize the properties of electrodeposits grown over a solid electrolyte channel. Such devices have an active anode and an inert cathode separated by a long electrodeposit channel in a coplanar arrangement. The ability to transport large amount of metallic mass across the channel makes these devices attractive for various More-Than-Moore applications. Existing literature lacks a comprehensive study of electrodeposit growth kinetics in lateral PMCs. Moreover, the morphology of electrodeposit growth in larger, planar devices is also not understood. Despite the variety of applications, lateral PMCs are not embraced by the semiconductor industry due to incompatible materials and high operating voltages needed for such devices. In this work, a numerical model based on the basic processes in PMCs – cation drift and redox reactions – is proposed, and the effect of various materials parameters on the electrodeposit growth kinetics is reported. The morphology of the electrodeposit growth and kinetics of the electrodeposition process are also studied in devices based on Ag-Ge30Se70 materials system. It was observed that the electrodeposition process mainly consists of two regimes of growth – cation drift limited regime and mixed regime. The electrodeposition starts in cation drift limited regime at low electric fields and transitions into mixed regime as the field increases. The onset of mixed regime can be controlled by applied voltage which also affects the morphology of electrodeposit growth. The numerical model was then used to successfully predict the device kinetics and onset of mixed regime. The problem of materials incompatibility with semiconductor manufacturing was solved by proposing a novel device structure. A bilayer structure using semiconductor foundry friendly materials was suggested as a candidate for solid electrolyte. The bilayer structure consists of a low resistivity oxide shunt layer on top of a high resistivity ion carrying oxide layer. Devices using Cu2O as the low resistivity shunt on top of Cu doped WO3 oxide were fabricated. The bilayer devices provided orders of magnitude improvement in device performance in the context of operating voltage and switching time. Electrical and materials characterization revealed the structure of bilayers and the mechanism of electrodeposition in these devices. === Dissertation/Thesis === Doctoral Dissertation Electrical Engineering 2020
author2 Chamele, Ninad (Author)
author_facet Chamele, Ninad (Author)
title Lateral Programmable Metallization Cells: Materials, Devices and Mechanisms
title_short Lateral Programmable Metallization Cells: Materials, Devices and Mechanisms
title_full Lateral Programmable Metallization Cells: Materials, Devices and Mechanisms
title_fullStr Lateral Programmable Metallization Cells: Materials, Devices and Mechanisms
title_full_unstemmed Lateral Programmable Metallization Cells: Materials, Devices and Mechanisms
title_sort lateral programmable metallization cells: materials, devices and mechanisms
publishDate 2020
url http://hdl.handle.net/2286/R.I.63069
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