Development of Nanosphere Lithography Technique with Enhanced Lithographical Accuracy on Periodic Si Nanostructure for Thin Si Solar Cell Application

Development of Nanosphere Lithography Technique with Enhanced Lithographical Accuracy on Periodic Si Nanostructure for Thin Si Solar Cell Application

abstract: In this thesis, a novel silica nanosphere (SNS) lithography technique has been developed to offer a fast, cost-effective, and large area applicable nano-lithography approach. The SNS can be easily deposited with a simple spin-coating process after introducing a N,N-dimethyl-formamide (DMF)...

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Bibliographic Details
Other Authors: Choi, Jeayoung (Author)
Format: Doctoral Thesis
Language:English
Published: 2015
Subjects:
Engineering
Energy
Lithography
Nanosphere
Nanostructure
Silicon
Solar
Online Access:http://hdl.handle.net/2286/R.I.29713

Internet

http://hdl.handle.net/2286/R.I.29713

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