Nanowire Specialty Diodes for Integrated Applications

abstract: Semiconductor nanowires are important candidates for highly scaled three dimensional electronic devices. It is very advantageous to combine their scaling capability with the high yield of planar CMOS technology by integrating nanowire devices into planar circuits. The purpose of this resea...

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Other Authors: Chandra, Nishant (Author)
Format: Doctoral Thesis
Language:English
Published: 2014
Subjects:
Online Access:http://hdl.handle.net/2286/R.I.24988
id ndltd-asu.edu-item-24988
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spelling ndltd-asu.edu-item-249882018-06-22T03:05:00Z Nanowire Specialty Diodes for Integrated Applications abstract: Semiconductor nanowires are important candidates for highly scaled three dimensional electronic devices. It is very advantageous to combine their scaling capability with the high yield of planar CMOS technology by integrating nanowire devices into planar circuits. The purpose of this research is to identify the challenges associated with the fabrication of vertically oriented Si and Ge nanowire diodes and modeling their electrical behavior so that they can be utilized to create unique three dimensional architectures that can boost the scaling of electronic devices into the next generation. In this study, vertical Ge and Si nanowire Schottky diodes have been fabricated using bottom-up vapor-liquid-solid (VLS) and top-down reactive ion etching (RIE) approaches respectively. VLS growth yields nanowires with atomically smooth sidewalls at sub-50 nm diameters but suffers from the problem that the doping increases radially outwards from the core of the devices. RIE is much faster than VLS and does not suffer from the problem of non-uniform doping. However, it yields nanowires with rougher sidewalls and gets exceedingly inefficient in yielding vertical nanowires for diameters below 50 nm. The I-V characteristics of both Ge and Si nanowire diodes cannot be adequately fit by the thermionic emission model. Annealing in forming gas which passivates dangling bonds on the nanowire surface is shown to have a considerable impact on the current through the Si nanowire diodes indicating that fixed charges and traps on the surface of the devices play a major role in determining their electrical behavior. Also, due to the vertical geometry of the nanowire diodes, electric field lines originating from the metal and terminating on their sidewalls can directly modulate their conductivity. Both these effects have to be included in the model aimed at predicting the current through vertical nanowire diodes. This study shows that the current through vertical nanowire diodes cannot be predicted accurately using the thermionic emission model which is suitable for planar devices and identifies the factors needed to build a comprehensive analytical model for predicting the current through vertically oriented nanowire diodes. Dissertation/Thesis Chandra, Nishant (Author) Goodnick, Stephen M (Advisor) Tracy, Clarence J (Committee member) Yu, Hongbin (Committee member) Ferry, David K (Committee member) Arizona State University (Publisher) Electrical engineering fabrication nanowire passivation reactive-ion-etching schottky vapor-liquid-solid eng 164 pages Ph.D. Electrical Engineering 2014 Doctoral Dissertation http://hdl.handle.net/2286/R.I.24988 http://rightsstatements.org/vocab/InC/1.0/ All Rights Reserved 2014
collection NDLTD
language English
format Doctoral Thesis
sources NDLTD
topic Electrical engineering
fabrication
nanowire
passivation
reactive-ion-etching
schottky
vapor-liquid-solid
spellingShingle Electrical engineering
fabrication
nanowire
passivation
reactive-ion-etching
schottky
vapor-liquid-solid
Nanowire Specialty Diodes for Integrated Applications
description abstract: Semiconductor nanowires are important candidates for highly scaled three dimensional electronic devices. It is very advantageous to combine their scaling capability with the high yield of planar CMOS technology by integrating nanowire devices into planar circuits. The purpose of this research is to identify the challenges associated with the fabrication of vertically oriented Si and Ge nanowire diodes and modeling their electrical behavior so that they can be utilized to create unique three dimensional architectures that can boost the scaling of electronic devices into the next generation. In this study, vertical Ge and Si nanowire Schottky diodes have been fabricated using bottom-up vapor-liquid-solid (VLS) and top-down reactive ion etching (RIE) approaches respectively. VLS growth yields nanowires with atomically smooth sidewalls at sub-50 nm diameters but suffers from the problem that the doping increases radially outwards from the core of the devices. RIE is much faster than VLS and does not suffer from the problem of non-uniform doping. However, it yields nanowires with rougher sidewalls and gets exceedingly inefficient in yielding vertical nanowires for diameters below 50 nm. The I-V characteristics of both Ge and Si nanowire diodes cannot be adequately fit by the thermionic emission model. Annealing in forming gas which passivates dangling bonds on the nanowire surface is shown to have a considerable impact on the current through the Si nanowire diodes indicating that fixed charges and traps on the surface of the devices play a major role in determining their electrical behavior. Also, due to the vertical geometry of the nanowire diodes, electric field lines originating from the metal and terminating on their sidewalls can directly modulate their conductivity. Both these effects have to be included in the model aimed at predicting the current through vertical nanowire diodes. This study shows that the current through vertical nanowire diodes cannot be predicted accurately using the thermionic emission model which is suitable for planar devices and identifies the factors needed to build a comprehensive analytical model for predicting the current through vertically oriented nanowire diodes. === Dissertation/Thesis === Ph.D. Electrical Engineering 2014
author2 Chandra, Nishant (Author)
author_facet Chandra, Nishant (Author)
title Nanowire Specialty Diodes for Integrated Applications
title_short Nanowire Specialty Diodes for Integrated Applications
title_full Nanowire Specialty Diodes for Integrated Applications
title_fullStr Nanowire Specialty Diodes for Integrated Applications
title_full_unstemmed Nanowire Specialty Diodes for Integrated Applications
title_sort nanowire specialty diodes for integrated applications
publishDate 2014
url http://hdl.handle.net/2286/R.I.24988
_version_ 1718700396146327552