Terbium iron cobalt diffusion barrier studies
Thin films (5nm ± 2nm thick) of ZrO2, Al2O3, TiO2, Sm, Gd, Zr, Ni, and Pt were deposited onto TbFeCo films (100nm ± 20nm thick) on silicon and graphite substrates and analyzed with XPS as prospective candidates for TbFeCo diffusion barriers. Metals were chosen primarily according to electronegativit...
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| Language: | en_US |
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The University of Arizona.
1988
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| Online Access: | http://hdl.handle.net/10150/276931 |