Control of Molecular Contaminants in Porous Low-k Dielectric Films and in UHP Gas Delivery Systems
As compared to silicon oxide, porous low-k dielectric materials are more susceptible to molecular contaminants. As the device feature size decreases, control of molecular contaminants in porous low-k dielectric films and in UHP gas delivery systems becomes increasingly more challenging. Moisture w...
| Main Author: | |
|---|---|
| Other Authors: | |
| Language: | EN |
| Published: |
The University of Arizona.
2008
|
| Online Access: | http://hdl.handle.net/10150/195243 |