Conquering Variability for Robust and Low Power Designs
As device feature sizes shrink to nano-scale, continuous technology scaling has led to a large increase in parameter variability during semiconductor manufacturing process. According to the source of uncertainty, parameter variations can be classified into three categories: process variations, envir...
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| Language: | en |
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The University of Arizona.
2011
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| Online Access: | http://hdl.handle.net/10150/145458 |