Impact of Scaling on Energy Deposition in Sensitive Volumes Due to Direct Ionization by Space Radiation
In order to continue scaling to the deep sub-micron region, device manufacturers have replaced polysilicon gates with metal gate stacks and typically use metal clad or metal silicide source/drain regions. The metals used in modern processes tend to be considerably heavier than silicon, leading to a...
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| Format: | Others |
| Language: | en |
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VANDERBILT
2014
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| Online Access: | http://etd.library.vanderbilt.edu/available/etd-07072014-142706/ |