Precursor design for materials applications
The importance of platinum group metals for catalytic and microelectronic applications has prompted research into the development of novel molecular precursors for chemical vapor deposition of thin films of these metals. A variety of molecular architectures, ligand systems, as well as deposition con...
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| Format: | Others |
| Language: | English |
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2012
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| Online Access: | http://hdl.handle.net/2152/ETD-UT-2011-12-4755 |