Electromigration critical length effect and early failures in Cu/oxide and Cu/low k interconnects
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ndltd-UTEXAS-oai-repositories.lib.utexas.edu-2152-7342015-09-20T16:49:13ZElectromigration critical length effect and early failures in Cu/oxide and Cu/low k interconnectsLee, Ki-donElectrodiffusionIntegrated circuits--MaterialsNot availabletext2008-08-28T21:33:09Z2008-08-28T21:33:09Z20032008-08-28T21:33:09ZThesiselectronicb56868169http://hdl.handle.net/2152/734563140023116369engCopyright is held by the author. Presentation of this material on the Libraries' web site by University Libraries, The University of Texas at Austin was made possible under a limited license grant from the author who has retained all copyrights in the works. |
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NDLTD |
language |
English |
format |
Others
|
sources |
NDLTD |
topic |
Electrodiffusion Integrated circuits--Materials |
spellingShingle |
Electrodiffusion Integrated circuits--Materials Lee, Ki-don Electromigration critical length effect and early failures in Cu/oxide and Cu/low k interconnects |
description |
Not available === text |
author |
Lee, Ki-don |
author_facet |
Lee, Ki-don |
author_sort |
Lee, Ki-don |
title |
Electromigration critical length effect and early failures in Cu/oxide and Cu/low k interconnects |
title_short |
Electromigration critical length effect and early failures in Cu/oxide and Cu/low k interconnects |
title_full |
Electromigration critical length effect and early failures in Cu/oxide and Cu/low k interconnects |
title_fullStr |
Electromigration critical length effect and early failures in Cu/oxide and Cu/low k interconnects |
title_full_unstemmed |
Electromigration critical length effect and early failures in Cu/oxide and Cu/low k interconnects |
title_sort |
electromigration critical length effect and early failures in cu/oxide and cu/low k interconnects |
publishDate |
2008 |
url |
http://hdl.handle.net/2152/734 |
work_keys_str_mv |
AT leekidon electromigrationcriticallengtheffectandearlyfailuresincuoxideandculowkinterconnects |
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1716819718337200128 |