Electromigration critical length effect and early failures in Cu/oxide and Cu/low k interconnects

Not available === text

Bibliographic Details
Main Author: Lee, Ki-don
Format: Others
Language:English
Published: 2008
Subjects:
Online Access:http://hdl.handle.net/2152/734
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spelling ndltd-UTEXAS-oai-repositories.lib.utexas.edu-2152-7342015-09-20T16:49:13ZElectromigration critical length effect and early failures in Cu/oxide and Cu/low k interconnectsLee, Ki-donElectrodiffusionIntegrated circuits--MaterialsNot availabletext2008-08-28T21:33:09Z2008-08-28T21:33:09Z20032008-08-28T21:33:09ZThesiselectronicb56868169http://hdl.handle.net/2152/734563140023116369engCopyright is held by the author. Presentation of this material on the Libraries' web site by University Libraries, The University of Texas at Austin was made possible under a limited license grant from the author who has retained all copyrights in the works.
collection NDLTD
language English
format Others
sources NDLTD
topic Electrodiffusion
Integrated circuits--Materials
spellingShingle Electrodiffusion
Integrated circuits--Materials
Lee, Ki-don
Electromigration critical length effect and early failures in Cu/oxide and Cu/low k interconnects
description Not available === text
author Lee, Ki-don
author_facet Lee, Ki-don
author_sort Lee, Ki-don
title Electromigration critical length effect and early failures in Cu/oxide and Cu/low k interconnects
title_short Electromigration critical length effect and early failures in Cu/oxide and Cu/low k interconnects
title_full Electromigration critical length effect and early failures in Cu/oxide and Cu/low k interconnects
title_fullStr Electromigration critical length effect and early failures in Cu/oxide and Cu/low k interconnects
title_full_unstemmed Electromigration critical length effect and early failures in Cu/oxide and Cu/low k interconnects
title_sort electromigration critical length effect and early failures in cu/oxide and cu/low k interconnects
publishDate 2008
url http://hdl.handle.net/2152/734
work_keys_str_mv AT leekidon electromigrationcriticallengtheffectandearlyfailuresincuoxideandculowkinterconnects
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