Design and development of material-based resolution enhancement techniques for optical lithography
The relentless commercial drive for smaller, faster, and cheaper semi-conductor devices has pushed the existing patterning technologies to their limits. Photolithography, one of the crucial processes that determine the feature size in a microchip, is currently facing this challenge. The immaturity o...
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| Format: | Others |
| Language: | en_US |
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2013
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| Online Access: | http://hdl.handle.net/2152/22248 |