Fundamental studies of copper diffusion barriers
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ndltd-UTEXAS-oai-repositories.lib.utexas.edu-2152-19582015-09-20T16:50:20ZFundamental studies of copper diffusion barriersEngbrecht, Edward RaymondThin filmsCopper wireMicroelectronics--Design and constructionNot availabletext2008-08-28T22:25:25Z2008-08-28T22:25:25Z20042008-08-28T22:25:25ZThesiselectronicb60772736http://hdl.handle.net/2152/1958679880953143737engCopyright is held by the author. Presentation of this material on the Libraries' web site by University Libraries, The University of Texas at Austin was made possible under a limited license grant from the author who has retained all copyrights in the works. |
collection |
NDLTD |
language |
English |
format |
Others
|
sources |
NDLTD |
topic |
Thin films Copper wire Microelectronics--Design and construction |
spellingShingle |
Thin films Copper wire Microelectronics--Design and construction Engbrecht, Edward Raymond Fundamental studies of copper diffusion barriers |
description |
Not available === text |
author |
Engbrecht, Edward Raymond |
author_facet |
Engbrecht, Edward Raymond |
author_sort |
Engbrecht, Edward Raymond |
title |
Fundamental studies of copper diffusion barriers |
title_short |
Fundamental studies of copper diffusion barriers |
title_full |
Fundamental studies of copper diffusion barriers |
title_fullStr |
Fundamental studies of copper diffusion barriers |
title_full_unstemmed |
Fundamental studies of copper diffusion barriers |
title_sort |
fundamental studies of copper diffusion barriers |
publishDate |
2008 |
url |
http://hdl.handle.net/2152/1958 |
work_keys_str_mv |
AT engbrechtedwardraymond fundamentalstudiesofcopperdiffusionbarriers |
_version_ |
1716820064269762560 |