TuneChip : post-silicon tuning of dual-vdd designs
As process technologies continue their rapid advancement, transistor features are shrinking to almost unimaginable sizes. Some dimensions can be measured at the atomic level. One consequence of these smaller devices is that they have become more susceptible to deviations from nominal than previous p...
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| Format: | Others |
| Language: | English |
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2012
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| Online Access: | http://hdl.handle.net/2152/18051 |