A study on the material and device characteristics of hafnium oxynitride MOSFETs with TaN gate electrodes

Not available === text

Bibliographic Details
Main Author: Kang, Changseok
Format: Others
Language:English
Published: 2008
Subjects:
Online Access:http://hdl.handle.net/2152/1153
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spelling ndltd-UTEXAS-oai-repositories.lib.utexas.edu-2152-11532015-09-20T16:49:33ZA study on the material and device characteristics of hafnium oxynitride MOSFETs with TaN gate electrodesKang, ChangseokHafnium compoundsHafnium oxideDielectricsTantalum electrodesMetal oxide semiconductor field-effect transistorsNot availabletext2008-08-28T21:48:59Z2008-08-28T21:48:59Z20042008-08-28T21:48:59ZThesiselectronicb59011178http://hdl.handle.net/2152/1153575511113143280engCopyright is held by the author. Presentation of this material on the Libraries' web site by University Libraries, The University of Texas at Austin was made possible under a limited license grant from the author who has retained all copyrights in the works.
collection NDLTD
language English
format Others
sources NDLTD
topic Hafnium compounds
Hafnium oxide
Dielectrics
Tantalum electrodes
Metal oxide semiconductor field-effect transistors
spellingShingle Hafnium compounds
Hafnium oxide
Dielectrics
Tantalum electrodes
Metal oxide semiconductor field-effect transistors
Kang, Changseok
A study on the material and device characteristics of hafnium oxynitride MOSFETs with TaN gate electrodes
description Not available === text
author Kang, Changseok
author_facet Kang, Changseok
author_sort Kang, Changseok
title A study on the material and device characteristics of hafnium oxynitride MOSFETs with TaN gate electrodes
title_short A study on the material and device characteristics of hafnium oxynitride MOSFETs with TaN gate electrodes
title_full A study on the material and device characteristics of hafnium oxynitride MOSFETs with TaN gate electrodes
title_fullStr A study on the material and device characteristics of hafnium oxynitride MOSFETs with TaN gate electrodes
title_full_unstemmed A study on the material and device characteristics of hafnium oxynitride MOSFETs with TaN gate electrodes
title_sort study on the material and device characteristics of hafnium oxynitride mosfets with tan gate electrodes
publishDate 2008
url http://hdl.handle.net/2152/1153
work_keys_str_mv AT kangchangseok astudyonthematerialanddevicecharacteristicsofhafniumoxynitridemosfetswithtangateelectrodes
AT kangchangseok studyonthematerialanddevicecharacteristicsofhafniumoxynitridemosfetswithtangateelectrodes
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