Fabrication and characterization of optical waveguide components in epitaxial (Pb,La)(Zr,Ti)O3 thin films.
This report presents a method for fabrication of ridge-type waveguide electro-optic modulators in 500 nm thick, c-oriented, epitaxial, (Pb0.92,La0.08)(Zr0.4,Ti0.6)O3 thin films on a MgO substrate. The method is based on ordinary photolitography and wet etching techniques with lift-off metallisation...
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| Format: | Others |
| Language: | English |
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Norges teknisk-naturvitenskapelige universitet, Institutt for elektronikk og telekommunikasjon
2009
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| Online Access: | http://urn.kb.se/resolve?urn=urn:nbn:no:ntnu:diva-9948 |