Offline study of next generation EUV pellicle materials and performances : From experimental design to material characterization
Lithography is the most crucial step in the semiconductor microfabrication workflow. Continuous features size shrinking co-occurs with the reduction of the exposure wavelength: a move from 193 nm light to extreme ultra-violet (EUV) at 13.5 nm is performed. The change poses a vast number of challenge...
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| Format: | Others |
| Language: | English |
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KTH, Skolan för elektroteknik och datavetenskap (EECS)
2019
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| Online Access: | http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-254554 |