Characterization of High-K Double Slot Grating Couplers for on-chip Interconnects
In this project, optical waveguides are analyzed with the intention of explain the principles of confine and guide light by using materials with a specific refractive index. The waveguide fabrication process in a silicon wafer is review as for the different type of devices or waveguides. Optical mea...
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KTH, Skolan för informations- och kommunikationsteknik (ICT)
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ndltd-UPSALLA1-oai-DiVA.org-kth-1093102013-01-08T13:46:04ZCharacterization of High-K Double Slot Grating Couplers for on-chip InterconnectsengColomer Molines, RaülKTH, Skolan för informations- och kommunikationsteknik (ICT)2012TECHNOLOGYTEKNIKVETENSKAPIn this project, optical waveguides are analyzed with the intention of explain the principles of confine and guide light by using materials with a specific refractive index. The waveguide fabrication process in a silicon wafer is review as for the different type of devices or waveguides. Optical measurements within a double slot grating couplers are performed achieving a waveguide loss of 0.01dBm/μm and a total efficiency of 25.5% per grating coupler. And an attempt to explain the different phenomena that causes a detrimental effect in the results as cleanliness conditions, equipment or the Gaussian beam effect is done. Student thesisinfo:eu-repo/semantics/bachelorThesistexthttp://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-109310Trita-ICT-EX ; 2012:284application/pdfinfo:eu-repo/semantics/openAccess |
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TECHNOLOGY TEKNIKVETENSKAP Colomer Molines, Raül Characterization of High-K Double Slot Grating Couplers for on-chip Interconnects |
description |
In this project, optical waveguides are analyzed with the intention of explain the principles of confine and guide light by using materials with a specific refractive index. The waveguide fabrication process in a silicon wafer is review as for the different type of devices or waveguides. Optical measurements within a double slot grating couplers are performed achieving a waveguide loss of 0.01dBm/μm and a total efficiency of 25.5% per grating coupler. And an attempt to explain the different phenomena that causes a detrimental effect in the results as cleanliness conditions, equipment or the Gaussian beam effect is done. |
author |
Colomer Molines, Raül |
author_facet |
Colomer Molines, Raül |
author_sort |
Colomer Molines, Raül |
title |
Characterization of High-K Double Slot Grating Couplers for on-chip Interconnects |
title_short |
Characterization of High-K Double Slot Grating Couplers for on-chip Interconnects |
title_full |
Characterization of High-K Double Slot Grating Couplers for on-chip Interconnects |
title_fullStr |
Characterization of High-K Double Slot Grating Couplers for on-chip Interconnects |
title_full_unstemmed |
Characterization of High-K Double Slot Grating Couplers for on-chip Interconnects |
title_sort |
characterization of high-k double slot grating couplers for on-chip interconnects |
publisher |
KTH, Skolan för informations- och kommunikationsteknik (ICT) |
publishDate |
2012 |
url |
http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-109310 |
work_keys_str_mv |
AT colomermolinesraul characterizationofhighkdoubleslotgratingcouplersforonchipinterconnects |
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1716528579737550848 |