Ion implantation patterning of high temperature superconducting thin films and multilayers
This thesis was motivated by the suggestion that selectively implanting YBa₂Cu₃0₇ (YBCO) films with a highly reactive ion, such as Si, could pattern without destroying or removing material. If true, this would greatly simplify conventional methods of patterning multilayer structures. This led to...
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| Format: | Others |
| Language: | English |
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2009
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| Online Access: | http://hdl.handle.net/2429/9922 |