Electron localisation in non-stoichimetric films of aluminum nitride produced by reactive sputtering
Sputtering is a very versatile process for the fabrication of thin solid Gims. The subject of this thesis concerns the study of thin films of non-stoichiometric aluminum nitride fabricated by voltage-controlled reactive sputtering. Using the cathode voltage on the sputtering target, the relative arr...
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| Language: | English |
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University of British Columbia
2010
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| Online Access: | http://hdl.handle.net/2429/27074 |