| Summary: | 碩士 === 國立臺北科技大學 === 材料科學與工程研究所 === 107 === Medicine injection has raised attention in recent years. The skin compose by stratum corneum, dermis, and hypodermis layer. The requirement of microneedle arrays must have high aspect ratio, biocompatibility, and easy pirece the skin arrived at dermis layer of the length.
In this work, we use three expose method of photolithography process to fabrication microneedle array, and we investigate relationship with the spin coating, photoresist viscosity, and exposure energy. It will influence the microneedle arrays structure. In addition, we utilize iridium and parylene C as the electrode and passivation materals, respectively.
Subsequently we compare platinum and iridium oxide electrochemical characteristic, and use the optical microscope and scanning electron microscope to observe the surface morphology. Otherwise, we utilize the charge storage capacity(CSC) and electrochemical impedance spectroscopy to evaluate the reliability by soaking test. In addition, we characterized the resistivity of the platinum and iridium oxide film electrode by hall effect measuring.
Finally, we would like to fabricate of the microneedle arrays can instead of the traditional needles and easy to pirece the skin into the dermis layer to achieve the purpose of painless injection. We also can obtain the electroencephalography(EEG), electrocardiography(ECG), electromyography(EMG) signal detection.
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