The Study on the Uniformity of a Functional Buffer Layer Deposited onto the Large-Scaled PMMA Substrate by Using the Very High Frequency Plasma Enhanced Chemical Vapor Deposition System
碩士 === 國立虎尾科技大學 === 光電工程系光電與材料科技碩士班 === 107 === This study used the Very High Frequency Plasma Enhanced Chemical Vapor Deposition (VHF-PECVD) with 30 x 30 cm2 large substrate holder and use tetramethylsilane (TMS) as a precursor. The organosilicon plasma polymerization thim films with different proc...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2019
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| Online Access: | http://ndltd.ncl.edu.tw/handle/bmu4mh |