Preparation of chromium nitride thin films using atmospheric pressure plasma process

碩士 === 國立高雄科技大學 === 化學工程與材料工程系 === 107

Bibliographic Details
Main Authors: YANG. WEI-HSUN, 楊偉勛
Other Authors: Hong-Ying Chen
Format: Others
Language:zh-TW
Published: 2019
Online Access:http://ndltd.ncl.edu.tw/handle/9k3b43
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spelling ndltd-TW-107NKUS00630512019-11-30T17:21:54Z http://ndltd.ncl.edu.tw/handle/9k3b43 Preparation of chromium nitride thin films using atmospheric pressure plasma process 以常壓電漿製程製備氮化鉻薄膜 YANG. WEI-HSUN 楊偉勛 碩士 國立高雄科技大學 化學工程與材料工程系 107 Hong-Ying Chen 陳弘穎 2019 學位論文 ; thesis 141 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立高雄科技大學 === 化學工程與材料工程系 === 107
author2 Hong-Ying Chen
author_facet Hong-Ying Chen
YANG. WEI-HSUN
楊偉勛
author YANG. WEI-HSUN
楊偉勛
spellingShingle YANG. WEI-HSUN
楊偉勛
Preparation of chromium nitride thin films using atmospheric pressure plasma process
author_sort YANG. WEI-HSUN
title Preparation of chromium nitride thin films using atmospheric pressure plasma process
title_short Preparation of chromium nitride thin films using atmospheric pressure plasma process
title_full Preparation of chromium nitride thin films using atmospheric pressure plasma process
title_fullStr Preparation of chromium nitride thin films using atmospheric pressure plasma process
title_full_unstemmed Preparation of chromium nitride thin films using atmospheric pressure plasma process
title_sort preparation of chromium nitride thin films using atmospheric pressure plasma process
publishDate 2019
url http://ndltd.ncl.edu.tw/handle/9k3b43
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AT yángwěixūn yǐchángyādiànjiāngzhìchéngzhìbèidànhuàluòbáomó
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