Precision of Double-Anode Localized Electrochemical Deposition system and Double helix DNA structure Control System

碩士 === 國立中央大學 === 機械工程學系 === 107 === In past years, Semiconductor technology is rapidly developed. Most of Semiconductor products were made by PVD (Physical Vapor Deposition), CVD (Chemical Vapor Deposition), photolithography, lithography, etc. However, in recent years, for fabricated complex 3D mic...

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Bibliographic Details
Main Authors: Chen-Hsu Wang, 王晨旭
Other Authors: 黃衍任
Format: Others
Language:zh-TW
Published: 2019
Online Access:http://ndltd.ncl.edu.tw/handle/89d95b
Description
Summary:碩士 === 國立中央大學 === 機械工程學系 === 107 === In past years, Semiconductor technology is rapidly developed. Most of Semiconductor products were made by PVD (Physical Vapor Deposition), CVD (Chemical Vapor Deposition), photolithography, lithography, etc. However, in recent years, for fabricated complex 3D microproducts, 3D printing and DMP (Direct Metal Printing) gradually become a new trend. In this research, we provide a technology, LECD (Localized Electrochemical Deposition), which is cheaper, environmental friendship, and efficiency than semiconductor technology. First part of this research is to find out the possibility of LECD. We measure the precision of LECD system in this research environment. Second part of this research, we try to use double anode to make a double-helix structure. In 2016, our lab already fabricated a helical string. In this year, we developed a brand new program based on Labview to fabricate a double helix microstructure. Compared to C++, it is easier to develop, and the responding speed is quicker. We expect it could provide us a high quality fabrication of microstructures. Keywords: Localized electrochemical deposition (LECD); Labview; Four-axis machine; Real-time image processing.