Business model of Contamination Solution and Management on Fab Application － A Case Study of P Company
碩士 === 國立交通大學 === 管理學院高階主管管理碩士學程 === 107 === Semiconductor micro-pollution prevention has only begun in the past decade because of the continuous improvement and improvement of processes (from 65 nm, 40/45 nm, 28 nm, 1× nm, to today's 7 nm, 5 nm and future 3 nm processes). Not only an important...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2019
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| Online Access: | http://ndltd.ncl.edu.tw/handle/zt3eu3 |