Investigation of Thermal Interface Materials to reduce contact resistance

碩士 === 國立交通大學 === 機械工程系所 === 107 === Advancement of the modern generation for fast, reliable and small computing devices has led to development of high power density per unit area. Most of this heat is to be dissipated using the various heat sinks. The unevenness or roughness of these surfaces offer...

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Bibliographic Details
Main Authors: Mahesh Khatiwada, 馬哈仕
Other Authors: Wang, Chi-Chuan
Format: Others
Language:en_US
Published: 2019
Online Access:http://ndltd.ncl.edu.tw/handle/esexh4