Structural Insight on Strain and Ge Content within SiGe Nanosheet Created by Proximal Ge Nanospheres
碩士 === 國立交通大學 === 電子研究所 === 107 === In this thesis, fabrication and characterization of silicon-germanium (SiGe) nanosheet as well as the associated nanosheet channel devices are investigated. By tuning the duration of thermal oxidation, we have demonstrated the precise controllability of penetratio...
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| Format: | Others |
| Language: | en_US |
| Published: |
2019
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| Online Access: | http://ndltd.ncl.edu.tw/handle/52bkwf |