Study of Optimal Imaging Capabilities of Polarization-Independent Liquid Crystal Lens Arrays Realized with Self-Aligned Photolithography Processes

碩士 === 國立成功大學 === 光電科學與工程學系 === 107

Bibliographic Details
Main Authors: Tzu-HsiangKao, 高子翔
Other Authors: Chia-Rong Sheu
Format: Others
Language:zh-TW
Published: 2019
Online Access:http://ndltd.ncl.edu.tw/handle/59dk9r
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spelling ndltd-TW-107NCKU56140052019-10-25T05:24:18Z http://ndltd.ncl.edu.tw/handle/59dk9r Study of Optimal Imaging Capabilities of Polarization-Independent Liquid Crystal Lens Arrays Realized with Self-Aligned Photolithography Processes 利用自對位黃光微影製程實現偏振無關液晶透鏡陣列與其成像品質優化研究 Tzu-HsiangKao 高子翔 碩士 國立成功大學 光電科學與工程學系 107 Chia-Rong Sheu 許家榮 2019 學位論文 ; thesis 64 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立成功大學 === 光電科學與工程學系 === 107
author2 Chia-Rong Sheu
author_facet Chia-Rong Sheu
Tzu-HsiangKao
高子翔
author Tzu-HsiangKao
高子翔
spellingShingle Tzu-HsiangKao
高子翔
Study of Optimal Imaging Capabilities of Polarization-Independent Liquid Crystal Lens Arrays Realized with Self-Aligned Photolithography Processes
author_sort Tzu-HsiangKao
title Study of Optimal Imaging Capabilities of Polarization-Independent Liquid Crystal Lens Arrays Realized with Self-Aligned Photolithography Processes
title_short Study of Optimal Imaging Capabilities of Polarization-Independent Liquid Crystal Lens Arrays Realized with Self-Aligned Photolithography Processes
title_full Study of Optimal Imaging Capabilities of Polarization-Independent Liquid Crystal Lens Arrays Realized with Self-Aligned Photolithography Processes
title_fullStr Study of Optimal Imaging Capabilities of Polarization-Independent Liquid Crystal Lens Arrays Realized with Self-Aligned Photolithography Processes
title_full_unstemmed Study of Optimal Imaging Capabilities of Polarization-Independent Liquid Crystal Lens Arrays Realized with Self-Aligned Photolithography Processes
title_sort study of optimal imaging capabilities of polarization-independent liquid crystal lens arrays realized with self-aligned photolithography processes
publishDate 2019
url http://ndltd.ncl.edu.tw/handle/59dk9r
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