Microwave Dielectric Properties Analysis of (1-x)TiO2-xSrTiO3 Bulk and (1-x)TiO2-xCaTiO3 Thin Films

碩士 === 國立虎尾科技大學 === 電子工程系碩士班 === 106 === The paper is divided into two parts. The first part deals with the material of (1-x)TiO2-xSrTiO3 with the sample shape of dielectric resonator to explore the microwave dielectric properties at different doping ratios(x=0~0.1). The second part studies the mate...

Full description

Bibliographic Details
Main Authors: CAI, JHIH-CIANG, 蔡志強
Other Authors: SHEEN, JYH
Format: Others
Language:zh-TW
Published: 2018
Online Access:http://ndltd.ncl.edu.tw/handle/yzzd9e
id ndltd-TW-106NYPI0428008
record_format oai_dc
spelling ndltd-TW-106NYPI04280082019-05-16T00:37:29Z http://ndltd.ncl.edu.tw/handle/yzzd9e Microwave Dielectric Properties Analysis of (1-x)TiO2-xSrTiO3 Bulk and (1-x)TiO2-xCaTiO3 Thin Films (1-x)TiO2-xSrTiO3塊體和(1-x)TiO2-xCaTiO3 薄膜之微波介電特性分析 CAI, JHIH-CIANG 蔡志強 碩士 國立虎尾科技大學 電子工程系碩士班 106 The paper is divided into two parts. The first part deals with the material of (1-x)TiO2-xSrTiO3 with the sample shape of dielectric resonator to explore the microwave dielectric properties at different doping ratios(x=0~0.1). The second part studies the material of 0.975TiO2-0.025CaTiO3 thin films, To conduct microwave dielectric analysis of TiO2-CaTiO3 thin material under the sputtering conditions with different gas ratios. The DR samples are made by solid state reaction method. TiO2 is adopted as the major material doped with different proportions of SrTiO3 with x=0~0.1. At a fixed firing temperature of 1200°C, two sets of samples are made under two different sintering temperatures of 1300°C and 1350°C. The microwave dielectric properties and physical properties of the DR samples are measured by network analyzer and the Archimedes measurement respectively. The results have showed that as the sintering temperature increased the doping concentration and samples density are increased there is a better performance of microwave dielectric characteristics. Through the X-ray analysis the diffraction peak intensity also increases with the increasing of SrTiO3 doping amount . The thin films formulation of (1-x)TiO2-xCaTiO3(x=0.025) adopted the reactive radio magnetic controlled sputtering method with a fixed doped ratio and sputtering method ,Under the growth conditions of various gas ratios of Ar and O2, thin films samples are measured by the resonant cavity perturbation technique using a network analyzer to explore the dielectric properties of the films under different doping environments. SHEEN, JYH 沈自 2018 學位論文 ; thesis 91 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立虎尾科技大學 === 電子工程系碩士班 === 106 === The paper is divided into two parts. The first part deals with the material of (1-x)TiO2-xSrTiO3 with the sample shape of dielectric resonator to explore the microwave dielectric properties at different doping ratios(x=0~0.1). The second part studies the material of 0.975TiO2-0.025CaTiO3 thin films, To conduct microwave dielectric analysis of TiO2-CaTiO3 thin material under the sputtering conditions with different gas ratios. The DR samples are made by solid state reaction method. TiO2 is adopted as the major material doped with different proportions of SrTiO3 with x=0~0.1. At a fixed firing temperature of 1200°C, two sets of samples are made under two different sintering temperatures of 1300°C and 1350°C. The microwave dielectric properties and physical properties of the DR samples are measured by network analyzer and the Archimedes measurement respectively. The results have showed that as the sintering temperature increased the doping concentration and samples density are increased there is a better performance of microwave dielectric characteristics. Through the X-ray analysis the diffraction peak intensity also increases with the increasing of SrTiO3 doping amount . The thin films formulation of (1-x)TiO2-xCaTiO3(x=0.025) adopted the reactive radio magnetic controlled sputtering method with a fixed doped ratio and sputtering method ,Under the growth conditions of various gas ratios of Ar and O2, thin films samples are measured by the resonant cavity perturbation technique using a network analyzer to explore the dielectric properties of the films under different doping environments.
author2 SHEEN, JYH
author_facet SHEEN, JYH
CAI, JHIH-CIANG
蔡志強
author CAI, JHIH-CIANG
蔡志強
spellingShingle CAI, JHIH-CIANG
蔡志強
Microwave Dielectric Properties Analysis of (1-x)TiO2-xSrTiO3 Bulk and (1-x)TiO2-xCaTiO3 Thin Films
author_sort CAI, JHIH-CIANG
title Microwave Dielectric Properties Analysis of (1-x)TiO2-xSrTiO3 Bulk and (1-x)TiO2-xCaTiO3 Thin Films
title_short Microwave Dielectric Properties Analysis of (1-x)TiO2-xSrTiO3 Bulk and (1-x)TiO2-xCaTiO3 Thin Films
title_full Microwave Dielectric Properties Analysis of (1-x)TiO2-xSrTiO3 Bulk and (1-x)TiO2-xCaTiO3 Thin Films
title_fullStr Microwave Dielectric Properties Analysis of (1-x)TiO2-xSrTiO3 Bulk and (1-x)TiO2-xCaTiO3 Thin Films
title_full_unstemmed Microwave Dielectric Properties Analysis of (1-x)TiO2-xSrTiO3 Bulk and (1-x)TiO2-xCaTiO3 Thin Films
title_sort microwave dielectric properties analysis of (1-x)tio2-xsrtio3 bulk and (1-x)tio2-xcatio3 thin films
publishDate 2018
url http://ndltd.ncl.edu.tw/handle/yzzd9e
work_keys_str_mv AT caijhihciang microwavedielectricpropertiesanalysisof1xtio2xsrtio3bulkand1xtio2xcatio3thinfilms
AT càizhìqiáng microwavedielectricpropertiesanalysisof1xtio2xsrtio3bulkand1xtio2xcatio3thinfilms
AT caijhihciang 1xtio2xsrtio3kuàitǐhé1xtio2xcatio3báomózhīwēibōjièdiàntèxìngfēnxī
AT càizhìqiáng 1xtio2xsrtio3kuàitǐhé1xtio2xcatio3báomózhīwēibōjièdiàntèxìngfēnxī
_version_ 1719168776407089152