Examining a novel mold for use in electrowetting-assisted nanoimprint lithography
碩士 === 國立聯合大學 === 機械工程學系碩士班 === 106 === In this study, a novel mold-filling method was proposed to improve the yield of nano-imprint process based on an electrowetting system created using a parallel electrode structure. During the nano-imprint process, mold filling and de-molding procedures are con...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2018
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| Online Access: | http://ndltd.ncl.edu.tw/handle/qmh2n9 |