A Study of CF4 Plasma Treatment for Improving the Electrical Characteristics and Stability of a-InGaZnO Thin-Film Transistors
碩士 === 國立臺灣科技大學 === 電子工程系 === 106 === Amorphous oxide semiconductor is considered to be the most competitive TFT material for last decade. It has several advantages such as great uniformity for large size display, low fabrication temperature and low production cost. In order to pursue greater metal...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2017
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| Online Access: | http://ndltd.ncl.edu.tw/handle/p4e6g2 |