| Summary: | 碩士 === 國立臺灣科技大學 === 化學工程系 === 106 === In this work, the photolytic degradation of gaseous nitrogen triflouride under VUV (vacuum ultraviolet) illumination in a batch reator was investigation in detail, including reaction kinetics and quantification of gaseous nitrogen triflouride.
In first part, the effect of VUV illumination without TiO2, concentration of nitrogen triflouride, amount of TiO2, area illumination of VUV, morphology and crystallite size of TiO2, oxygen concentration and relative humidity on photolytic reaction rate were studied for derivation of kinetic model. A rational reaction mechanism was satisfactorily developed by using power law model and batch design equation. According to the experimental results, the reaction behavior obeys first-order reaction.
The energy of VUV light was strong enough for the degration of gaseous nitrogen triflouride. However, nitrogen triflouride would not be adsorbed on the TiO2 surface, resulting in the low photocatalytic reaction rate. The products of photolytic degradation of gaseous nitrogen triflouride was respectively determined by fourier transform infrared spectroscopy and ionic chromatography.
|
|---|
