Growth of Bi Nanowires by Thermal Evaporation

碩士 === 國立臺灣大學 === 物理學研究所 === 106 === In this study, we grew Bi nanowires through thermal evaporation and catalyst-free mechanism in the high-vacuum chamber. First, we used XRD to measure the thickness of the Bi films grown at different temperatures. From this, we can calibrate the deposition rate of...

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Main Authors: Chong-Yu Wu, 吳重諭
Other Authors: Ming-Yau Chern
Format: Others
Language:zh-TW
Published: 2018
Online Access:http://ndltd.ncl.edu.tw/handle/74qwsg
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spelling ndltd-TW-106NTU051980092019-05-16T00:22:53Z http://ndltd.ncl.edu.tw/handle/74qwsg Growth of Bi Nanowires by Thermal Evaporation 以熱蒸鍍法成長鉍奈米線之研究 Chong-Yu Wu 吳重諭 碩士 國立臺灣大學 物理學研究所 106 In this study, we grew Bi nanowires through thermal evaporation and catalyst-free mechanism in the high-vacuum chamber. First, we used XRD to measure the thickness of the Bi films grown at different temperatures. From this, we can calibrate the deposition rate of Bi on glass. Then, through SEM, we can observe the morphology of the sample surface. Using the same deposition procedure on other substrates, including mica, graphite and C60, we found that this method was not effective for growing Bi nanowires. Since the result on the films of C60 was better, we tried to coat a thin film at low temperature first, and then grew nanowires at high temperature. It was successful in growing many long Bi nanowires. Then, applying the same method to other substrates, we found that it did not work well under the same conditions. Next, in order to verify the proposed growth mechanism, we used AFM to check the surface of the substrates. At last, contact transfer of the nanowires from the substrates had better result for the C60 substrates. We used electron beam lithography system to fabricate the circuit for electrical tests so we can compare the resistivity of Bi nanowires of different diameters. Ming-Yau Chern 陳銘堯 2018 學位論文 ; thesis 98 zh-TW
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language zh-TW
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description 碩士 === 國立臺灣大學 === 物理學研究所 === 106 === In this study, we grew Bi nanowires through thermal evaporation and catalyst-free mechanism in the high-vacuum chamber. First, we used XRD to measure the thickness of the Bi films grown at different temperatures. From this, we can calibrate the deposition rate of Bi on glass. Then, through SEM, we can observe the morphology of the sample surface. Using the same deposition procedure on other substrates, including mica, graphite and C60, we found that this method was not effective for growing Bi nanowires. Since the result on the films of C60 was better, we tried to coat a thin film at low temperature first, and then grew nanowires at high temperature. It was successful in growing many long Bi nanowires. Then, applying the same method to other substrates, we found that it did not work well under the same conditions. Next, in order to verify the proposed growth mechanism, we used AFM to check the surface of the substrates. At last, contact transfer of the nanowires from the substrates had better result for the C60 substrates. We used electron beam lithography system to fabricate the circuit for electrical tests so we can compare the resistivity of Bi nanowires of different diameters.
author2 Ming-Yau Chern
author_facet Ming-Yau Chern
Chong-Yu Wu
吳重諭
author Chong-Yu Wu
吳重諭
spellingShingle Chong-Yu Wu
吳重諭
Growth of Bi Nanowires by Thermal Evaporation
author_sort Chong-Yu Wu
title Growth of Bi Nanowires by Thermal Evaporation
title_short Growth of Bi Nanowires by Thermal Evaporation
title_full Growth of Bi Nanowires by Thermal Evaporation
title_fullStr Growth of Bi Nanowires by Thermal Evaporation
title_full_unstemmed Growth of Bi Nanowires by Thermal Evaporation
title_sort growth of bi nanowires by thermal evaporation
publishDate 2018
url http://ndltd.ncl.edu.tw/handle/74qwsg
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