N+/P Hybrid Poly-Si Shell Structure Junctionless Field-Effect Transistors by Electron Beam Lithography Dosage Adjusted Mask Method

N+/P Hybrid Poly-Si Shell Structure Junctionless Field-Effect Transistors by Electron Beam Lithography Dosage Adjusted Mask Method

碩士 === 國立清華大學 === 工程與系統科學系 === 106

Bibliographic Details
Main Authors:	Chiang, Ya-Ying, 江亞穎
Other Authors:	Wu, Yung-Chun
Format:	Others
Language:	en_US
Published:	2018
Online Access:	http://ndltd.ncl.edu.tw/handle/m8wxes

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