Development and Improvement of Extremely Ultraviolet Photoresist Containing Twelve, Six, Four and Other Tin Clusters

碩士 === 國立清華大學 === 化學系所 === 106

Bibliographic Details
Main Authors: Fu, Jui-Hung, 傅睿紘
Other Authors: Liu, Rai-Shung
Format: Others
Language:zh-TW
Published: 2018
Online Access:http://ndltd.ncl.edu.tw/handle/62h6ey
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spelling ndltd-TW-106NTHU50650932019-07-04T05:59:37Z http://ndltd.ncl.edu.tw/handle/62h6ey Development and Improvement of Extremely Ultraviolet Photoresist Containing Twelve, Six, Four and Other Tin Clusters 極強紫外線光阻材料開發及改良,多種錫團簇系統材料合成 Fu, Jui-Hung 傅睿紘 碩士 國立清華大學 化學系所 106 Liu, Rai-Shung 劉瑞雄 2018 學位論文 ; thesis 438 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立清華大學 === 化學系所 === 106
author2 Liu, Rai-Shung
author_facet Liu, Rai-Shung
Fu, Jui-Hung
傅睿紘
author Fu, Jui-Hung
傅睿紘
spellingShingle Fu, Jui-Hung
傅睿紘
Development and Improvement of Extremely Ultraviolet Photoresist Containing Twelve, Six, Four and Other Tin Clusters
author_sort Fu, Jui-Hung
title Development and Improvement of Extremely Ultraviolet Photoresist Containing Twelve, Six, Four and Other Tin Clusters
title_short Development and Improvement of Extremely Ultraviolet Photoresist Containing Twelve, Six, Four and Other Tin Clusters
title_full Development and Improvement of Extremely Ultraviolet Photoresist Containing Twelve, Six, Four and Other Tin Clusters
title_fullStr Development and Improvement of Extremely Ultraviolet Photoresist Containing Twelve, Six, Four and Other Tin Clusters
title_full_unstemmed Development and Improvement of Extremely Ultraviolet Photoresist Containing Twelve, Six, Four and Other Tin Clusters
title_sort development and improvement of extremely ultraviolet photoresist containing twelve, six, four and other tin clusters
publishDate 2018
url http://ndltd.ncl.edu.tw/handle/62h6ey
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