Improvement on Critical Dimension Stability of Black Matrix of Color Filters

• Main Authors: PI, SHUO-CHIEH, 皮碩傑
• Other Authors: KAO, TZUNG-TA
• Format: Others
• Language: zh-TW
• Published: 2019
• Online Access: http://ndltd.ncl.edu.tw/handle/26bjpb

碩士 === 國立高雄科技大學 === 電機工程系 === 107 === The color filter is a key component that makes the display bright and vivid, thus enhances the added value of the liquid crystal display. Its basic structure is composed of a glass substrate deposited with Black Matrix, an RGB color layer, Over Coat and PS layer (Photo Spacer), which replaces the Cell spacer of the Cell process. The black matrix resist, applied to the color filter of the liquid crystal display, is a key raw material of the color filter due to its high-light shielding property that separates the RGB three primary colors and improves the contrast. In contrast to the early use of Chromium Cr as a material for BM, the BM resin is the mainstream material today due to the characteristics of high gloss shielding Sensitivity, adhesion, heat resistance, light resistance, chemical resistance and storage stability, and also the considerations of low cost and low pollution of the process. The technical development direction of color filters is driven by the demands from consumers for their continuous pursuit of lighter, thinner and higher image quality. Thus, color filters are gradually moving toward high brightness, contrast, and color saturation, and resulted smaller and denser Pixel on the color filter of the high-quality panel. To meet the tightening specification of original black matrix CD (Critical Dimension), the color filter black matrix process capability must be enhanced to improve production quality and reduce production Cost. The Six Sigma Methodology is used in this study. The variation factors are the exposure, HP temperature and development time, all of which are expected to have a significant effect on the black matrix CD (Critical Dimension), while the different temperature of developer tanks, the number of pieces run in production and the HP contact time also have a significant effect on the stability of the black matrix CD (Critical Dimension), and Mask bending has an impact on some areas of the substrate. Through analyze the collected data from the experiments, using different parameter combinations, the black matrix CD (Critical Dimension) stability has been improved.