Improvement of TFT LCD Yield Loss due to AS-Residue Occurred During Process
碩士 === 國立彰化師範大學 === 光電科技研究所 === 106 === This thesis is to investigate the cause of residue left on the amorphous silicon (a-Si) layer during process procedures of thin film transistor (TFT) liquid crystal display (LCD). The residue could be left on the a-Si layer after dry etch process of the second...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2018
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| Online Access: | http://ndltd.ncl.edu.tw/handle/s8m6uf |