Development of In-situ Monitoring System for the Surface Temperature of Wafer, Thin Film Growth-rate and Refractive Index in Semiconductor Process
碩士 === 國立中央大學 === 光機電工程研究所 === 106 === An in-situ monitoring system for the semiconductor process is presented, which is used to monitor the temperature of wafer surface, the growth-rate and the refractive index of thin film in the semiconductor thin film process. The principles of the monitoring sy...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2018
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| Online Access: | http://ndltd.ncl.edu.tw/handle/3wpj59 |