| Summary: | 碩士 === 國立交通大學 === 理學院應用科技學程 === 106 === Semiconductor industry is an industry that requires highly technology and innovation. The use of immersion lithography technology is an important milestone for Moore's Law to continue in the 21st century. The immersion lithography technology has been adopted since 2003, which is still the mainstream high-order lithography technology. On the other hand, Extreme ultraviolet lithography is considered to have sufficient development potential in recent years to become a new generation of advanced lithography technology after the immersion lithography. Related industries have been competing for development and expect to adopt EUVL in high-volume manufacturing. It is seems to be imperative that adopting Extreme ultraviolet lithography to break through the next technology node.
This study mainly adopts the specific scope of the U.S. patent database to evaluate the overall patent trends and the technology-function matrix of two technologies, "immersion lithography technology" and " Extreme ultraviolet lithography technology". The patent tendency of macroscopic is gradually to a microscopic analysis of the particular case, and ASML company is the main analysis object to understand the information disclosed in the patent information of specific technology fields. In this study, the application trends over the years and technology life cycles from the perspective of patents are observed, the sub-domain technologies are classified, and the core objectives of patents are found. Based on this, the R&D direction and patent portfolio of companies are inferred, and the future of technology is speculated. This study can serve as a strategic reference for the development of the industry, and can also serve as a research and development direction for researchers and technicians.
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