| Summary: | 碩士 === 國立交通大學 === 管理學院工業工程與管理學程 === 106 === In recent years, due to the rapid development of network applications, including cloud computing architecture, a variety of diverse network platforms, online application services, mobile handheld devices, and data center come to our life. No matter is enterprises or consumers, the bandwidth requirements of the network transmission speed continuously to increase. Therefore, the development of the optical communication has a considerable impact not only on Taiwan but also on the world. The DFB laser is one of the most important semiconductor laser sources in the fiber-optic industry chain, and DFB grating process is also an important one that affects the performance of laser characteristics. The grating process includes some related procedures for cleaning the wafer surface, lithography process, etching process, photoresist removal and pattern measurement inspection. However, the quality of the raster pattern is mainly determined by the photolithography process before etching. When the photolithography process is poorly controlled, the raster pattern abnormality and over-etching will be caused, resulting in an increase rework rate or poor quality of the post-process. Consequently, it may cause a product delays in delivery and decline in capacity utilization. Photolithography process is a key control site. This study takes a company in Taiwan as a case to find the optimize parameter-level setting of DFB laser grating photolithography, find out the factors affecting grating photolithography from photoresist coating, exposure, to development process. Use Two Level Factorial Design. After confirming the important factors, use Central Composite Design method of the Response Surface Methodology to find the optimal factor level combination. The results of the study are verified that the proposed method could effectively improve the quality of the photolithography process of grating.
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