Applications of Energy Flux and Numerical Analyses to the Plasma Etching of Silicon Deep Trench Isolation (DTI) Structures
碩士 === 國立成功大學 === 機械工程學系 === 106 === The deep trench isolation (DTI) structure plays an important role in the three-dimensional integrated circuit, and the most efficient way to etch an anisotropic DTI structure is to use the BOSCH etching method. However, setting the operating parameters of the BOS...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2018
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| Online Access: | http://ndltd.ncl.edu.tw/handle/95y4j9 |