Photo Resist Residue Study by TRIZ Method – Photo Electric Industry Coating Machine as The Case

• Main Authors: LIAO,YI-HUNG, 廖宜鴻
• Other Authors: LIN, YOUN-JAN
• Format: Others
• Language: zh-TW
• Published: 2018
• Online Access: http://ndltd.ncl.edu.tw/handle/jvcdcu

碩士 === 明新科技大學 === 管理研究所碩士在職專班 === 106 === Due to the fierce competition in the market of photovoltaic panel industries, low cost and high profit are the constant pursuit. The improvement of the coating machine is a way to reduce cost. Thus, it is necessary to refine the equipment. In this study, we found out the key cause of the photoresist residue removal problem was in the structure of the coating machine by Function Analysis and Cause-Effect Chains Analysis in the TRIZ theory. Then, we used the methods of Resource Analysis, Technical Contradictions, Physical contradictions and 40 Invention Principles with reference to the Scientific Effect Database to propose feasible improvement plans. In the end of this study, based on the resource analysis and scientific verification theory in the TRIZ theory, we found out three innovative solutions, that is, "Wiper cleaner seat support spring coefficient improvement", "cleaner nozzle renovation" and "Wiper cleaner seat CDA nozzle modification." In addition to solving the photoresist residue removal problem of the coating machine, through actual verification, we found that this innovative design can reduce the overall anomalous rate of photoresist residue removal from 1.18% down to 0.042%. It nearly meets the required standard rate (within 0.04%) of the photoresist residue removal anomalous rate, a rate that is hard to reach in the present industries. The overall production improvement efficiency is as high as 96.4%, and can save about 30 million NTD (2,947,200 ) for the company monthly. This innovative design hasn't been used in the industries. It is a groundbreaking improvement.